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Inventor

Jiann-Jen Chiou

Inventor
Tainan, TW

Overview

3→
Patents
2002–2011
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
H10DInorganic electric semiconductor devices25%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
PatentTitleYear
8,084,357'Method for manufacturing a dual damascene opening comprising a trench opening and a via opening'20116,503,837'Method of rinsing residual etching reactants/products on a semiconductor wafer'20036,387,750'Method of forming MIM capacitor'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2003Patents assigned to MACRONIX INT CO LTD (2)· patent assignee history
2002–2011Based in Tainan, TW· patent location history
2003Based in Hsin-Ying, TW· patent location history
2011Patents assigned to CHEN MEI-LING (1)· patent assignee history
2011Patents assigned to CHEN WEI-CHIH (1)· patent assignee history
2011Patents assigned to CHIOU JIANN-JEN (1)· patent assignee history
2011Patents assigned to HSU FENG-YU (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MACRONIX INT CO LTD22002–2003
CHEN MEI-LING12011
CHEN WEI-CHIH12011
CHIOU JIANN-JENself12011
HSU FENG-YU12011
Locations
LocationPatentsSpan
Tainan, TW22002–2011
Hsin-Ying, TW12003