Inventor
Rodney C. Langley
Inventor
Boise, ID, US
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1044%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
H01JElectric discharge tubes or discharge lamps11%
Y10TTechnical subjects covered by former us classification11%
C23CCoating metallic material6%
G01NInvestigating or analysing materials by determining their chemical or physical properties6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
PatentTitleYear
RE040819'Semiconductor device with improved bond pads'20096,838,390'Method and apparatus for plasma etching a wafer'20056,424,733'Method and apparatus for inspecting wafers'20026,380,100'Semiconductor processing apparatuses, and methods of forming antireflective coating materials over substrates'20026,293,789'Semiconductor processing apparatuses'20016,248,671'Semiconductor processing apparatuses, and methods of forming antireflective coating materials over substrates'20016,080,272'Method and apparatus for plasma etching a wafer'20005,789,754'Leak detection method and apparatus for plasma processing equipment'19985,686,762'Semiconductor device with improved bond pads'19975,376,235'Method to eliminate corrosion in conductive elements'19945,221,414'Process and system for stabilizing layer deposition and etch rates while simultaneously maintaining cleanliness in a water processing reaction chamber'19935,217,926'Method of passivating a semiconductor wafer'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2009Patents assigned to MICRON TECHNOLOGY INC (11)· patent assignee history
1993–2009Based in Boise, ID, US· patent location history
1994Patents assigned to MICRON SEMICONDUCTOR INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 11 | 1993–2009 |
| MICRON SEMICONDUCTOR INC | 1 | 1994 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 12 | 1993–2009 |