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Inventor

Khoi Doan

Inventor
San Jose, CA, US

Overview

4→
Patents
2012–2015
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1027%
H01LSemiconductor devices18%
G11CStatic stores9%
H10BElectronic memory devices9%
H10NElectric solid-state devices not otherwise provided for9%
PatentTitleYear
9,059,398'Methods for etching materials used in MRAM applications'20158,980,754'Method of removing a photoresist from a low-k dielectric film'20158,647,990'Method of patterning a low-K dielectric film'20148,314,033'Method of patterning a low-k dielectric film'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2015Patents assigned to APPLIED MATERIALS INC (4)· patent assignee history
2012–2015Patents assigned to DOAN KHOI (3)· patent assignee history
2012–2015Patents assigned to NEMANI SRINIVAS D (3)· patent assignee history
2012–2015Patents assigned to ZHOU YIFENG (3)· patent assignee history
2012–2015Patents assigned to PENDER JEREMIAH T P (2)· patent assignee history
2012–2015Based in San Jose, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC42012–2015
DOAN KHOIself32012–2015
NEMANI SRINIVAS D32012–2015
ZHOU YIFENG32012–2015
PENDER JEREMIAH T P22012–2015
Locations
LocationPatentsSpan
San Jose, California, US42012–2015