Inventor
Linda Karin Sundberg
Inventor
Los Gatos, CA, US
Overview
Patents· 43 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
C08LCompositions of macromolecular compounds8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
B05DProcesses for applying fluent materials to surfaces, in general4%
H01LSemiconductor devices4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems3%
PatentTitleYear
10,915,023Nitrogen heterocycle-containing monolayers on metal oxides for binding biopolymers202110,345,700Negative-tone resist compositions and multifunctional polymers therein201910,236,184Porous tin oxide films201910,174,229Adhesive resins for wafer bonding201910,020,199Porous tin oxide films20189,850,406Adhesive resins for wafer bonding20179,389,516'Resist performance for the negative tone develop organic development process'20169,250,529'Photoresist compositions and methods of use in high index immersion lithography'20169,181,426'Method of controlling orientation of domains in block copolymer films'20159,057,960'Resist performance for the negative tone develop organic development process'20158,945,808'Self-topcoating resist for photolithography'20158,900,802'Positive tone organic solvent developed chemically amplified resist'20148,821,978'Methods of directed self-assembly and layered structures formed therefrom'20148,802,357'Method for using a topcoat composition'20148,802,351'Water-dispersible electrically conductive fluorine-containing polyaniline compositions for lithography'20148,703,386'Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applications'20148,530,136'Fluoroalcohol containing molecular photoresist materials and processes of use'20138,491,965'Method of controlling orientation of domains in block copolymer films'20138,440,387'Graded topcoat materials for immersion lithography'20138,426,113'Chemically amplified silsesquioxane resist compositions'20138,236,482'Photoresist compositions and methods of use in high index immersion lithography'20128,088,873'Topcoat composition'20128,053,537'Method for using a topcoat composition'20118,034,532'High contact angle topcoat material and use thereof in lithography process'20118,003,309'Photoresist compositions and methods of use in high index immersion lithography'20117,993,812'Calixarene blended molecular glass photoresists and processes of use'20117,989,026'Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films'20117,951,524'Self-topcoating photoresist for photolithography'20117,931,829'Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures'20117,910,290'Photoresist topcoat for a photolithographic process'20117,901,868'Photoresist topcoat for a photolithographic process'20117,855,045'Immersion topcoat materials with improved performance'20107,820,242'Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures'20107,763,319'Method of controlling orientation of domains in block copolymer films'20107,728,089'Topcoat compositions and methods of use thereof'20107,678,537'Graded topcoat materials for immersion lithography'20107,521,090'Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films'20097,521,172'Topcoat material and use thereof in immersion lithography processes'20097,473,749'Preparation of topcoat compositions and methods of use thereof'20097,459,183'Method of forming low-K interlevel dielectric layers and structures'20087,399,581'Photoresist topcoat for a photolithographic process'20087,358,035'Topcoat compositions and methods of use thereof'20087,288,362'Immersion topcoat materials with improved performance'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2021Patents assigned to IBM (43)· patent assignee history
2007–2021Based in Los Gatos, CA, US· patent location history
2012–2016Patents assigned to SUNDBERG LINDA KARIN (9)· patent assignee history
2012–2016Patents assigned to ITO HIROSHI (4)· patent assignee history
2012–2016Patents assigned to SANDERS DANIEL PAUL (4)· patent assignee history
2013–2014Patents assigned to KIM HO-CHEOL (3)· patent assignee history
2015–2016Based in Armonk, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 43 | 2007–2021 |
| SUNDBERG LINDA KARINself | 9 | 2012–2016 |
| ITO HIROSHI | 4 | 2012–2016 |
| SANDERS DANIEL PAUL | 4 | 2012–2016 |
| KIM HO-CHEOL | 3 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Los Gatos, California, US | 41 | 2007–2021 |
| Armonk, New York, US | 2 | 2015–2016 |