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Inventor

CHING-YUEH CHEN

Inventor
TW

Overview

5→
Patents
2022–2025
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices71%
H01LSemiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
PatentTitleYear
12,287,581Method of manufacturing semiconductor devices using a photomask202512,124,163Mask defect prevention202411,860,530Mask defect prevention202411,402,743Mask defect prevention202211,226,551Lithographic mask, a pellicle therein and method of forming the same2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (5)· patent assignee history
2022–2025Based in TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD52022–2025
Locations
LocationPatentsSpan
TW52022–2025