Inventor

DOUGLAS A. KESZLER

Inventor
US

Overview

25→
Patents
2022–2026
Patent span
Physics
Primary field (CPC G)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
C23CCoating metallic material15%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
Y10TTechnical subjects covered by former us classification9%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form2%
B41JTypewriters2%
B82YSpecific uses or applications of nanostructures2%
C01FCompounds of the metals beryllium, magnesium, aluminium, calcium, strontium, barium, radium, thorium, or of the rare-earth metals2%
C01GCompounds containing metals not covered by subclasses c01d or c01f2%
PatentTitleYear
12,578,646Organotin oxide hydroxide patterning compositions, precursors, and patterning202612,554,195Radiation based patterning methods202612,498,641Process environment for inorganic resist patterning202512,487,522Organometallic solution based high resolution patterning compositions and corresponding methods202512,443,105Organotin oxide hydroxide patterning compositions, precursors, and patterning202512,276,913Organotin oxide hydroxide patterning compositions, precursors, and patterning202512,235,578Organometallic solution based high resolution patterning compositions202512,189,286Organometallic solution based high resolution patterning compositions202511,988,961Radiation based patterning methods202411,988,960Organometallic solution based high resolution patterning compositions202411,988,959Organometallic solution based high resolution patterning compositions and corresponding methods202411,988,958Organometallic solution based high resolution patterning compositions202411,966,159Organometallic solution based high resolution patterning compositions202411,947,262Process environment for inorganic resist patterning202411,809,081Organotin oxide hydroxide patterning compositions, precursors, and patterning202311,754,924Organotin oxide hydroxide patterning compositions, precursors, and patterning202311,693,312Radiation based patterning methods202311,599,022Radiation based patterning methods202311,566,328Amorphous thin films and method of making202311,537,048Organotin oxide hydroxide patterning compositions, precursors, and patterning202211,500,284Organometallic solution based high resolution patterning compositions and corresponding methods202211,392,031Radiation based patterning methods202211,392,029Organometallic solution based high resolution patterning compositions and corresponding methods202211,299,399Synthesis of M13 clusters from aluminum and gallium mineral polymorphs202211,279,129Amorphous thin metal film2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2026Patents assigned to INPRIA CORP (22)· patent assignee history
2022–2023Patents assigned to UNIV OREGON STATE (3)· patent assignee history
2022Patents assigned to HEWLETT PACKARD DEVELOPMENT CO (1)· patent assignee history
2022Patents assigned to THE STATE OF OREGON STATE BOARD OF HIGHER EDUCATION ON BEHALF OF OREGON STATE UNIV (1)· patent assignee history
2022–2026Based in US· patent location history
2025Patents assigned to INRPIA CORP (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INPRIA CORP222022–2026
UNIV OREGON STATE32022–2023
HEWLETT PACKARD DEVELOPMENT CO12022
INRPIA CORP12025
THE STATE OF OREGON STATE BOARD OF HIGHER EDUCATION ON BEHALF OF OREGON STATE UNIV12022
Locations
LocationPatentsSpan
US252022–2026