Inventor
PO-CHIN CHANG
Inventor
TW
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices29%
H10DInorganic electric semiconductor devices23%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1020%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
B82YSpecific uses or applications of nanostructures4%
H01JElectric discharge tubes or discharge lamps4%
LOC144%
A61BDiagnosis1%
G01VGeophysics1%
PatentTitleYear
12,575,156Reducing pattern loading in the etch-back of metal gate202612,527,065Semiconductor device and method for forming the same202612,494,423Semiconductor device including stacked via contact and method for manufacturing the same202512,457,790Semiconductor device including conductive nitride feature and method of making the semiconductor device202512,433,006Semiconductor device with conductive liners over silicide structures and method of making the semiconductor device202512,431,431Conductive structure interconnects with downward projections202512,432,977Semiconductor device and method for manufacturing the same202512,408,406Semiconductor device and manufacturing method thereof202512,327,788Gate to source drain interconnects2025D1072834Monitor stand2025D1070867Monitor stand202512,261,082Semiconductor devices with a nitrided capping layer202512,230,507Method of manufacturing semiconductor devices using directional process202512,094,951Capping structures in semiconductor devices202412,087,558Ion beam etching apparatus and method202412,051,620Semiconductor structure and method for manufacturing the same202412,034,059Reducing pattern loading in the etch-back of metal gate2024D1026862Stand for monitor202411,978,672Semiconductor device with elongated pattern202411,881,401Method of forming metal features202411,862,465Fine line patterning methods202411,652,152Capping structures in semiconductor devices202311,651,972Method of manufacturing semiconductor devices using directional process202311,626,506Reducing pattern loading in the etch-back of metal gate202311,469,143Semiconductor device with elongated pattern202211,373,902Semiconductor structure and method for manufacturing the same202211,313,989Detecting device202211,239,078Fine line patterning methods2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (24)· patent assignee history
2022Patents assigned to UNIV NAT CENTRAL (1)· patent assignee history
2022–2026Based in TW· patent location history
2024–2025Patents assigned to WISTRON CORP (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 24 | 2022–2026 |
| WISTRON CORP | 3 | 2024–2025 |
| UNIV NAT CENTRAL | 1 | 2022 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 28 | 2022–2026 |