Inventor
Yi-Liang Ye
Inventor
Kaohsiung, TW
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices30%
H10DInorganic electric semiconductor devices28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
A61KPreparations for medical, dental or toiletry purposes2%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
PatentTitleYear
10,980,8123-(4-((4-(morpholinomethyl-benzyl)oxy)-1 -oxoisoindolin-2-yl)piperidine-2,6-dione for the treatment of systemic lupus erythematosus202110,796,943Manufacturing method of semiconductor structure202010,651,174FinFET structure and fabricating method of gate structure202010,622,481Method of rounding corners of a fin202010,446,667Method for fabricating semiconductor device201910,340,268FinFET structure and fabricating method of gate structure201910,332,741Method for post chemical mechanical polishing clean201910,332,981Semiconductor device and method for fabricating the same201910,312,084Semiconductor device and fabrication method thereof20199,966,266Apparatus for semiconductor wafer treatment and semiconductor wafer treatment20189,960,084Method for forming semiconductor device20189,899,520'Method for fabricating semiconductor device'20189,793,105'Fabricating method of fin field effect transistor (FinFET)'20179,748,111'Method of fabricating semiconductor structure using planarization process and cleaning process'20179,627,534'Semiconductor MOS device having a dense oxide film on a spacer'20179,613,808'Method of forming multilayer hard mask with treatment for removing impurities and forming dangling bonds'20179,570,315'Method of interfacial oxide layer formation in semiconductor device'2017Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2017–2020Patents assigned to UNITED MICROELECTRONICS CORP (16)· patent assignee history
2017–2020Based in Kaohsiung, TW· patent location history
2021Patents assigned to CELGENE CORP (1)· patent assignee history
2021Based in Branchburg, NJ, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNITED MICROELECTRONICS CORP | 16 | 2017–2020 |
| CELGENE CORP | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kaohsiung, TW | 16 | 2017–2020 |
| Branchburg, New Jersey, US | 1 | 2021 |