Inventor
Jae In Moon
Inventor
Seoul, KR
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices35%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H10BElectronic memory devices12%
H04WWireless communication networks9%
H10DInorganic electric semiconductor devices9%
H04BTransmission6%
H04LTransmission of digital information, e.g. telegraphic communication6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
11,109,403Method and apparatus for scheduling uplink data in mobile communication system202111,071,018Method and device for configuring cell in wireless communication system202111,064,381Method and apparatus for generating cell measurement information in a wireless communication system20218,771,527'Method of manufacturing an extreme ultraviolet mask'20148,329,362'Extreme ultraviolet mask'20128,250,496'Method for transferring self-assembled dummy pattern to substrate'20128,242,021'Method for manufacturing semiconductor device'20128,216,948'Exposure mask and method for forming semiconductor device using the same'20128,197,991'Manufacturing method of a semiconductor device'20128,163,190'Method for fabricating a fine pattern'20127,964,325'Mask and method for forming a semiconductor device using the same'20117,838,176'Photo mask and method for fabricating the same'20107,838,181'Photo mask and method for manufacturing semiconductor device using the same'20107,820,344'Method for forming line pattern array, photomask having the same and semiconductor device fabricated thereby'20107,820,345'Exposure mask and a method of making a semiconductor device using the mask'20107,811,722'Photomask and method for fabricating the same'20107,774,738'Lithography method for forming a circuit pattern'20107,712,070'Method for transferring self-assembled dummy pattern to substrate'20107,546,564'Method for verifying optical proximity correction using layer versus layer comparison'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2012Patents assigned to HYNIX SEMICONDUCTOR INC (15)· patent assignee history
2009Based in Kyungki-do, KR· patent location history
2010–2012Based in Seoul, KR· patent location history
2010–2014Based in Icheon-si, KR· patent location history
2012Patents assigned to MOON JAE IN (6)· patent assignee history
2014Patents assigned to SK HYNIX INC (1)· patent assignee history
2021Patents assigned to SAMSUNG ELECTRONICS CO LTD (3)· patent assignee history
2021Based in Suwon-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HYNIX SEMICONDUCTOR INC | 15 | 2009–2012 |
| MOON JAE INself | 6 | 2012 |
| SAMSUNG ELECTRONICS CO LTD | 3 | 2021 |
| SK HYNIX INC | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 11 | 2010–2012 |
| Icheon-si, KR | 4 | 2010–2014 |
| Suwon-si, KR | 3 | 2021 |
| Kyungki-do, KR | 1 | 2009 |