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Inventor

Pieter-Jan Van Zwol

Inventor
Eindhoven, NL

Overview

3→
Patents
2021
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
G02BOptical elements, systems or apparatus25%
PatentTitleYear
11,036,128Membrane assembly202110,983,431Pellicle and pellicle assembly202110,908,496Membrane for EUV lithography2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2021Patents assigned to ASML HOLDING NV (1)· patent assignee history
2021Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32021
ASML HOLDING NV12021
Locations
LocationPatentsSpan
Eindhoven, NL32021