Inventor
Hong-Yi Wu
Inventor
Hsinchu, TW
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H01LSemiconductor devices14%
H10DInorganic electric semiconductor devices14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
C23CCoating metallic material7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
G05BControl or regulating systems in general7%
H01JElectric discharge tubes or discharge lamps7%
Y02PClimate change mitigation technologies in the production or processing of goods7%
PatentTitleYear
9,716,090'FinFet structure'20179,406,675'FinFET structure and method of manufacturing the same'20167,323,212'Method and system of controlling dummy dispense'20087,282,122'Method and system for target lifetime'20077,145,459'Systems and methods for manufacturing control using radio frequency identification'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006Patents assigned to TAIWAN SEMICONDUCTOR MFG CO M (1)· patent assignee history
2006–2017Based in Hsinchu, TW· patent location history
2007–2008Patents assigned to TAIWAN SEMICONDUCTOR MFG (2)· patent assignee history
2016–2017Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG | 2 | 2007–2008 |
| TAIWAN SEMICONDUCTOR MFG CO LTD | 2 | 2016–2017 |
| TAIWAN SEMICONDUCTOR MFG CO M | 1 | 2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 5 | 2006–2017 |