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Inventor

Nobunori Abe

Inventor
Kanagawa, JP

Overview

6→
Patents
1997–2020
Patent span
Physics
Primary field (CPC G)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
PatentTitleYear
10,626,205Method for producing copolymer20206,309,795'Resist composition'20016,010,826'Resist composition'20005,773,190'Resist composition'19985,707,784'Method of forming chemically amplified resist pattern and manufacturing for semiconductor device by using the chemically amplified resist pattern'19985,688,628'Resist composition'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2001Patents assigned to NIPPON ZEON CO (5)· patent assignee history
1997–1998Patents assigned to FUJITSU LTD (2)· patent assignee history
1997–2001Based in Kanagawa, JP· patent location history
1998–2020Based in Tokyo, JP· patent location history
1998Based in Yokohama, JP· patent location history
2020Patents assigned to ZEON CORP (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIPPON ZEON CO51997–2001
FUJITSU LTD21997–1998
ZEON CORP12020
Locations
LocationPatentsSpan
Kanagawa, JP31997–2001
Tokyo, JP21998–2020
Yokohama, JP11998