Inventor
ROBERT JAY RAFAC
Inventor
US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Gprimary
H05GX-ray technique46%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein8%
PatentTitleYear
12,369,244Laser system for source material conditioning in an EUV light source202512,238,848EUV light source target metrology202512,171,053System for monitoring a plasma202412,078,934Laser system for target metrology and alteration in an EUV light source202411,758,639Determining moving properties of a target in an extreme ultraviolet light source202311,266,002System for monitoring a plasma2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to ASML NETHERLANDS BV (6)· patent assignee history
2022–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 6 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 6 | 2022–2025 |