Inventor
Yayi Wei
Inventor
Altamont, NY, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H04Wprimary
H04WWireless communication networks15%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems9%
G06FElectric digital data processing9%
H10DInorganic electric semiconductor devices9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
B05DProcesses for applying fluent materials to surfaces, in general4%
H04LTransmission of digital information, e.g. telegraphic communication4%
B82YSpecific uses or applications of nanostructures2%
PatentTitleYear
11,051,343Communication system for supporting carrier aggregation and method and apparatus for updating system information thereof202111,051,235Wireless telecommunications apparatuses and methods202111,044,698Telecommunications apparatus and methods202111,044,649Transmission of uplink reference signalling according to different uplink reference signalling configurations202111,026,159Entity and user equipment for a mobile telecommunications system202111,019,678Telecommunications apparatus and methods202111,019,473Communication device and communication method20218,921,166'Structure and method for placement, sizing and shaping of dummy structures'20148,912,489'Defect removal process'20148,507,186'Patterning methods and masks'20138,227,174'Patterning methods and masks'20127,868,427'Structure and method for placement, sizing and shaping of dummy structures'20117,662,436'Method of spin coating a film of non-uniform thickness'20107,494,930'Structure and method for placement, sizing and shaping of dummy structures'20097,199,062'Method for forming a resist film on a substrate having non-uniform topography'20077,071,074'Structure and method for placement, sizing and shaping of dummy structures'20066,755,956'Catalyst-induced growth of carbon nanotubes on tips of cantilevers and nanowires'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004Based in Fishkill, NY, US· patent location history
2006–2014Patents assigned to INFINEON TECHNOLOGIES AG (8)· patent assignee history
2006–2014Based in Altamont, NY, US· patent location history
2009Based in Montrose, NY, US· patent location history
2012–2013Patents assigned to WEI YAYI (2)· patent assignee history
2014Patents assigned to GLOBALFOUNDRIES INC (1)· patent assignee history
2021Patents assigned to SONY CORP (7)· patent assignee history
2021Patents assigned to SONY MOBILE COMMUNICATIONS INC (1)· patent assignee history
2021Based in Basingstoke, GB· patent location history
2021Based in Beijing, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INFINEON TECHNOLOGIES AG | 8 | 2006–2014 |
| SONY CORP | 7 | 2021 |
| WEI YAYIself | 2 | 2012–2013 |
| GLOBALFOUNDRIES INC | 1 | 2014 |
| SONY MOBILE COMMUNICATIONS INC | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Altamont, New York, US | 8 | 2006–2014 |
| Basingstoke, GB | 5 | 2021 |
| Beijing, CN | 2 | 2021 |
| Montrose, New York, US | 1 | 2009 |
| Fishkill, New York, US | 1 | 2004 |