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Inventor

Xianjian DUAN

Inventor
CN

Overview

2→
Patents
2024–2025
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Jprimary
B01JChemical or physical processes, e.g. catalysis or colloid chemistry29%
C01BNon-metallic elements29%
B01DSeparation14%
B05DProcesses for applying fluent materials to surfaces, in general14%
C09CTreatment of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties14%
PatentTitleYear
12,234,361Combined treatment device and method for surface modification of fumed silica202512,162,771Gas nozzle, gas reaction device and gas hydrolysis reaction method2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2025Patents assigned to GUANGZHOU HUIFU RES INSTITUTE CO LTD (2)· patent assignee history
2024–2025Patents assigned to HUBEI HUIFU NANOMATERIAL CO LTD (2)· patent assignee history
2024–2025Based in CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
GUANGZHOU HUIFU RES INSTITUTE CO LTD22024–2025
HUBEI HUIFU NANOMATERIAL CO LTD22024–2025
Locations
LocationPatentsSpan
CN22024–2025