Inventor
Misako Kobayashi
Inventor
Tokyo, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
A61KPreparations for medical, dental or toiletry purposes11%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations11%
A61QSpecific use of cosmetics or similar toiletry preparations11%
PatentTitleYear
7,588,747'Singlet oxygen quencher and composition using the same'2009RE037846'Projection optical system and exposure apparatus using the same'20025,835,285'Projection optical system and exposure apparatus using the same'19985,781,278'Projection optical system and exposure apparatus with the same'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998Patents assigned to NIKON CORP (2)· patent assignee history
1998–2009Based in Tokyo, JP· patent location history
1998Based in Setagaya, JP· patent location history
2002Patents assigned to NIPPON KOGAKU KK (1)· patent assignee history
2009Patents assigned to APT CO LTD (1)· patent assignee history
2009Patents assigned to KOSE CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 2 | 1998 |
| APT CO LTD | 1 | 2009 |
| KOSE CORP | 1 | 2009 |
| NIPPON KOGAKU KK | 1 | 2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 3 | 1998–2009 |
| Setagaya, JP | 1 | 1998 |