Inventor
Takamasa Satoh
Inventor
Kawasaki, JP
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps46%
B82YSpecific uses or applications of nanostructures36%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
H03MCoding2%
PatentTitleYear
7,919,750'Electron gun, electron beam exposure apparatus, and exposure method'20117,777,202'Electron beam exposure apparatus involving the position and velocity calculation'20107,557,357'D/A conversion device and method and charged particle beam exposure apparatus and method'20096,727,658'Electron beam generating apparatus and electron beam exposure apparatus'20046,646,275'Charged particle beam exposure system and method'20036,486,479'Charged particle beam exposure system and method'20026,252,344'Electron gun used in an electron beam exposure apparatus'20016,242,751'Charged-particle-beam exposure device and charged-particle-beam exposure method'20016,188,074'Charged particle beam exposure apparatus'20016,118,129'Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements'20006,057,907'Method of and system for exposing pattern on object by charged particle beam'20005,977,548'Charged particle beam exposure system and method'19995,969,365'Charged-particle-beam exposure device and charged-particle-beam exposure method'19995,965,895'Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure'19995,920,077'Charged particle beam exposure system'19995,866,300'Method of and system for exposing pattern on object by charged particle beam'19995,841,145'Method of and system for exposing pattern on object by charged particle beam'19985,757,015'Charged-particle-beam exposure device and charged-particle-beam exposure method'19985,744,810'Method and system for exposing pattern on object by charged particle beam'19985,721,432'Method of and system for charged particle beam exposure'19985,719,402'Method of and system for charged particle beam exposure'19985,631,113'Electron-beam exposure system for reduced distortion of electron beam spot'19975,614,725'Charged particle beam exposure system and method'19975,546,319'Method of and system for charged particle beam exposure'19965,528,048'Charged particle beam exposure system and method'19965,444,257'Electron-beam exposure system for reduced distortion of electron beam spot'19955,401,974'Charged particle beam exposure apparatus and method of cleaning the same'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2003Patents assigned to FUJITSU LTD (21)· patent assignee history
1995–1997Patents assigned to FUJITSU VLSI LTD (2)· patent assignee history
1995–2003Based in Kawasaki, JP· patent location history
2001–2011Patents assigned to ADVANTEST CORP (6)· patent assignee history
2001–2011Based in Tokyo, JP· patent location history
2009Patents assigned to HITACHI INF & COMM ENG LTD (1)· patent assignee history
2011Patents assigned to DENKI KAGAKU KOGYO KK (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJITSU LTD | 21 | 1995–2003 |
| ADVANTEST CORP | 6 | 2001–2011 |
| FUJITSU VLSI LTD | 2 | 1995–1997 |
| DENKI KAGAKU KOGYO KK | 1 | 2011 |
| HITACHI INF & COMM ENG LTD | 1 | 2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 21 | 1995–2003 |
| Tokyo, JP | 6 | 2001–2011 |