Inventor

WATARU OMORI

Inventor

Overview

2023

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary

B24BMachines, devices, or processes for grinding or polishing25%

B24DTools for grinding, buffing or sharpening25%

H01LSemiconductor devices25%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2023Patents assigned to NORITAKE CO LTD (1)· patent assignee history

2023Based in JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NORITAKE CO LTD	1	2023

Locations

Location	Patents	Span
JP	1	2023