Inventor

Mineo Nomoto

Inventor

Yokohama, JP

Overview

1983–2014

Patent span

Physics

Primary field (CPC G)

Patents· 31 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary

G01NInvestigating or analysing materials by determining their chemical or physical properties17%

G01BMeasuring length, thickness or similar linear dimensions13%

G06TImage data processing or generation, in general11%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%

B24BMachines, devices, or processes for grinding or polishing7%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%

H10DInorganic electric semiconductor devices6%

B23KSoldering or unsoldering4%

B82YSpecific uses or applications of nanostructures4%

G01QScanning-probe techniques or apparatus4%

PatentTitleYear

8,659,761'Method and apparatus for measuring displacement of a sample using a wire grid polarizer to generate interference light'2014 8,629,985'Displacement measurement method and apparatus thereof, stage apparatus, and probe microscope'2014 8,284,406'Displacement measurement method and apparatus thereof, stage apparatus, and probe microscope'2012 8,064,066'Method and apparatus for measuring displacement of a sample to be inspected using an interference light'2011 7,834,353'Method of manufacturing display device'2010 7,612,889'Method and apparatus for measuring displacement of a sample'2009 7,498,589'Scanning probe microscope'2009 7,336,816'Method and apparatus for measuring shape of bumps'2008 7,326,623'Method of manufacturing display device'2008 7,272,253'Method for non-destructive inspection, apparatus thereof and digital camera system'2007 7,215,807'Nondestructive inspection method and apparatus'2007 7,129,124'Display device, process of fabricating same, and apparatus for fabricating same'2006 7,119,908'Method and apparatus for measuring thickness of thin film and device manufacturing method using same'2006 7,057,744'Method and apparatus for measuring thickness of thin film and device manufacturing method using same'2006 7,020,306'Polishing pad surface condition evaluation method and an apparatus thereof and a method of producing a semiconductor device'2006 6,987,874'Method and apparatus for managing surface image of thin film device, and method and apparatus for manufacturing thin film device using the same'2006 6,950,545'Nondestructive inspection method and apparatus'2005 6,943,086'Laser annealing apparatus, TFT device and annealing method of the same'2005 6,897,079'Method of detecting and measuring endpoint of polishing processing and its apparatus and method of manufacturing semiconductor device using the same'2005 6,794,206'Method of polishing a film'2004 6,072,899'Method and device of inspecting three-dimensional shape defect'2000 5,973,777'Method and apparatus for inspecting defects of surface shape'1999 5,645,351'Temperature measuring method using thermal expansion and an apparatus for carrying out the same'1997 5,301,248'Method for pattern inspection and apparatus therefor'1994 5,015,097'Method for inspecting filled state of via-holes filled with fillers and apparatus for carrying out the method'1991 4,872,187'X-ray tomographic imaging system and method'1989 4,776,023'Pattern inspection method'1988 4,744,047'Pattern test apparatus including a plurality of pattern generators'1988 4,628,531'Pattern checking apparatus'1986 4,420,233'Projecting apparatus'1983 4,391,511'Light exposure device and method'1983

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1983–2014Patents assigned to HITACHI LTD (27)· patent assignee history

1983–2014Based in Yokohama, JP· patent location history

2011–2014Patents assigned to BABA SHUICHI (4)· patent assignee history

2011–2014Patents assigned to NAKATA TOSHIHIKO (4)· patent assignee history

2011–2014Patents assigned to NOMOTO MINEO (4)· patent assignee history

2011–2014Patents assigned to WATANABE MASAHIRO (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HITACHI LTD	27	1983–2014
BABA SHUICHI	4	2011–2014
NAKATA TOSHIHIKO	4	2011–2014
NOMOTO MINEOself	4	2011–2014
WATANABE MASAHIRO	4	2011–2014

Locations

Location	Patents	Span
Yokohama, JP	31	1983–2014