Inventor
KELVIN CHAN
Inventor
US
Overview
Patents· 38 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
C23CCoating metallic material19%
H01LSemiconductor devices18%
H01JElectric discharge tubes or discharge lamps8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
H04LTransmission of digital information, e.g. telegraphic communication6%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
H10DInorganic electric semiconductor devices3%
B05DProcesses for applying fluent materials to surfaces, in general2%
PatentTitleYear
12,539,530Throttle valve and foreline cleaning using a microwave source202612,505,988—202512,482,641Printed microwave resonator for measuring high electron density plasmas202512,422,210Techniques and device structures based upon directional dielectric deposition and bottom-up fill202512,406,837Reaction cell for species sensing202512,394,670Nucleation-free gap fill ALD process202512,368,024Methods and apparatus for processing a substrate202512,325,910Deposition of conformal and gap-fill amorphous silicon thin-films202512,300,491Deposition of semiconductor integration films202512,282,256Photoresist deposition using independent multichannel showerhead202512,228,534Capacitive sensor for monitoring gas concentration202512,192,104Congestion notification reporting for a responsive network202512,131,948Techniques for void-free material depositions202412,094,707Plasma enhanced CVD with periodic high voltage bias202412,012,652Single process volume to perform high-pressure and low-pressure processes with features to reduce cross-contamination202411,968,038System and method to measure and score application health via correctable errors202411,960,826Managing a sharing of media content among client computers202411,959,868Capacitive sensor for monitoring gas concentration202411,955,331Method of forming silicon nitride films using microwave plasma202411,956,978Techniques and device structure based upon directional seeding and selective deposition202411,909,522System and method to measure and score application health via correctable errors202411,887,856Enhanced spatial ALD of metals through controlled precursor mixing202411,886,120Deposition of semiconductor integration films202411,843,541Congestion notification reporting for a responsive network202311,817,320CVD based oxide-metal multi structure for 3D NAND memory devices202311,776,805Selective oxidation and simplified pre-clean202311,749,564Techniques for void-free material depositions202311,702,742Methods of forming nucleation layers with halogenated silanes202311,621,160Doped and undoped vanadium oxides for low-k spacer applications202311,562,904Deposition of semiconductor integration films202311,562,902Hydrogen management in plasma deposited films202311,551,905Resonant process monitor202311,459,652Techniques and device structures based upon directional dielectric deposition and bottom-up fill202211,463,383Multi-destination packet redaction202211,436,406Managing a sharing of media content amount client computers202211,404,314Metal line patterning202211,289,374Nucleation-free gap fill ALD process202211,174,551Methods for depositing tungsten on halosilane based metal silicide nucleation layers2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to APPLIED MATERIALS INC (31)· patent assignee history
2021–2026Based in US· patent location history
2022–2025Patents assigned to CISCO TECH INC (5)· patent assignee history
2022–2024Patents assigned to GOOGLE LLC (2)· patent assignee history
2023Patents assigned to INTEL CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 31 | 2021–2026 |
| CISCO TECH INC | 5 | 2022–2025 |
| GOOGLE LLC | 2 | 2022–2024 |
| INTEL CORP | 1 | 2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 38 | 2021–2026 |