Inventor

Makoto Konagai

Inventor

Shinagawa-ku, JP

Overview

2→

Patents

1985–1996

Patent span

General tagging of new technological developments

Primary field (CPC Y)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary

C23CCoating metallic material17%

H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation17%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%

Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution17%

Y02PClimate change mitigation technologies in the production or processing of goods17%

Y10TTechnical subjects covered by former us classification17%

PatentTitleYear

5,545,443'Method for producing a transparent conductive ZnO film by incorporating a boron or aluminum containing material'1996 4,551,575'Substrate for amorphous silicon semiconductor material'1985

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1985Patents assigned to MITSUBISHI CHEM IND (1)· patent assignee history

1985Based in Tokyo, JP· patent location history

1996Patents assigned to KONAGAI MAKOTO (1)· patent assignee history

1996Patents assigned to YOSHIDA KOGYO KK (1)· patent assignee history

1996Based in Shinagawa-ku, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
KONAGAI MAKOTOself	1	1996
MITSUBISHI CHEM IND	1	1985
YOSHIDA KOGYO KK	1	1996

Locations

Location	Patents	Span
Shinagawa-ku, JP	1	1996
Tokyo, JP	1	1985