Inventor

Chiyoe Yamanaka

Inventor

Osaka, JP

Overview

1983–1999

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Sprimary

H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light17%

B01DSeparation8%

B82YSpecific uses or applications of nanostructures8%

C30BSingle-crystal growth8%

G01NInvestigating or analysing materials by determining their chemical or physical properties8%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%

G11BInformation storage based on relative movement between record carrier and transducer8%

G21BFusion reactors8%

G21KHandling of particles or ionising radiation not otherwise provided for8%

H05GX-ray technique8%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1983–1987Patents assigned to UNIV OSAKA (2)· patent assignee history

1983–1987Based in Ashiya, JP· patent location history

1989Based in Hyogo, JP· patent location history

1996–1999Patents assigned to INST LASER TECHNOLOGY (2)· patent assignee history

1996–1999Patents assigned to NAKAI SADAO (2)· patent assignee history

1996Patents assigned to FUJI ELECTRIC CO LTD (1)· patent assignee history

1996–1999Based in Osaka, JP· patent location history

1999Patents assigned to HAMAMATSU PHOTONICS KK (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations