Inventor
Keisuke Nakazawa
Inventor
Yokohama, JP
Overview
Patents· 29 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
H10BElectronic memory devices12%
H10DInorganic electric semiconductor devices11%
H01LSemiconductor devices9%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
B05CApparatus for applying fluent materials to surfaces, in general4%
B05DProcesses for applying fluent materials to surfaces, in general4%
F01CRotary-piston or oscillating-piston machines or engines4%
F04CRotary-piston, or oscillating-piston, positive-displacement machines for liquids4%
PatentTitleYear
10,549,312Spin coating apparatus and method202010,218,874Information processing system, information processing apparatus, information processing method, and information processing program20199,793,111'Spin coating method and manufacturing method of electronic component'20179,765,783'Vane-rotary gas compressor'20179,628,665'Information processing system, information processing apparatus, information processing method, and recording medium'20179,556,872'Gas compressor formed with a high-pressure supply hole'20179,437,476'Method of manufacturing semiconductor device including air gap between patterns'20169,431,291'Method of making openings in a semiconductor device with reduced residue by transferring layers'20169,278,373'Spin coating apparatus and method'20168,975,196'Manufacturing method of semiconductor device and manufacturing apparatus of semiconductor device'20158,956,132'Compressor'20158,835,279'Method of manufacturing semiconductor device'20148,659,114'Semiconductor device'20148,652,571'Spin coating method and spin coating apparatus'20148,642,409'Semiconductor device and method of manufacturing the same'20148,629,035'Method of manufacturing semiconductor device'20148,592,939'Semiconductor device and manufacturing method thereof'20138,329,553'Method for manufacturing semiconductor device and NAND-type flash memory'20128,080,463'Semiconductor device manufacturing method and silicon oxide film forming method'20117,781,341'Method of manufacturing semiconductor device'20107,531,408'Method of manufacturing a semiconductor device containing a PbxSr(1-x)[Zr,Ti]xRu(1-x)O3 film in a capacitor'20097,407,864'Polysilazane perhydride solution and method of manufacturing a semiconductor device using the same'20087,378,329'Method for manufacturing semiconductor device'20087,259,094'Apparatus and method for heat treating thin film'20077,233,040'Semiconductor device contains a PbxSr(1−x)[Zr, Ti]xRu(1−x)O3 film in a capacitor'20077,183,601'Semiconductor device and method for manufacturing thereof'20077,105,400'Manufacturing method of semiconductor device'20066,780,547'Halftone phase shifting photomask and blanks for halftone phase shifting photomask therefor and a method for forming pattern by using the halftone phase shifting photomask'20046,709,791'Halftone phase shift photomask and blanks for halftone phase shift photomask for it and pattern forming method using this'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004Patents assigned to DAINIPPON PRINTING CO LTD (2)· patent assignee history
2004–2014Based in Yokohama, JP· patent location history
2004–2009Based in Tokyo, JP· patent location history
2007–2017Patents assigned to TOSHIBA KK (20)· patent assignee history
2011–2019Patents assigned to NAKAZAWA KEISUKE (11)· patent assignee history
2011–2012Patents assigned to HOSHI TAKESHI (2)· patent assignee history
2014–2019Based in Kanagawa, JP· patent location history
2015–2017Patents assigned to CALSONIC KANSEI CORP (3)· patent assignee history
2015–2017Based in Mie, JP· patent location history
2016–2020Based in Yokkaichi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 20 | 2007–2017 |
| NAKAZAWA KEISUKEself | 11 | 2011–2019 |
| CALSONIC KANSEI CORP | 3 | 2015–2017 |
| DAINIPPON PRINTING CO LTD | 2 | 2004 |
| HOSHI TAKESHI | 2 | 2011–2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 12 | 2004–2014 |
| Tokyo, JP | 5 | 2004–2009 |
| Yokkaichi, JP | 3 | 2016–2020 |
| Kanagawa, JP | 3 | 2014–2019 |
| Mie, JP | 3 | 2015–2017 |