Inventor
Koichi Misumi
Inventor
Kawasaki, JP
Overview
Patents· 40 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
Y10TTechnical subjects covered by former us classification9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution7%
C09JAdhesives6%
Y02PClimate change mitigation technologies in the production or processing of goods5%
H01LSemiconductor devices5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%
C08LCompositions of macromolecular compounds4%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation4%
PatentTitleYear
10,829,662Curable composition, cured product, cured film, display panel, and method for producing cured product202010,640,607Curable composition, cured film, display panel, and method for producing cured product202010,570,269Composition containing microparticles202010,364,372Composition and method of producing siliceous film201910,023,540Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element20189,981,914Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element20189,436,084'Positive-working photoresist composition for thick film formation'20169,299,874'Coating apparatus and coating method'20169,186,696'Coating apparatus including a chamber, sensor, removal unit and control device for application of liquid to a substrate'20159,105,929'Negative electrode base member'20159,017,932'Processed substrate and method for manufacturing same'20158,999,746'Method of forming metal chalcogenide dispersion, metal chalcogenide dispersion, method of producing light absorbing layer of solar cell, method of producing solar cell'20158,992,874'Method of producing hydrazine-coordinated Cu chalcogenide complex'20158,927,147'Negative electrode base member'20158,901,235'Adhesive composition, film adhesive, and heat treatment method'20148,901,234'Adhesive composition'20148,877,884'Adhesive composition, film adhesive, and method for producing the adhesive composition'20148,835,050'Anode substrate'20148,617,795'Photosensitive resin composition and pattern forming method using the same'20138,551,651'Secondary cell having negative electrode base member'20138,507,180'Chemically amplified positive-type photoresist composition for thick film, chemically amplified dry film for thick film, and method for production of thick film resist pattern'20138,485,126'Coating apparatus including a glove part and a controller for stopping coating'20138,426,543'Adhesive composition and adhesive film'20138,389,204'Method for producing comb-shaped electrode'20138,288,078'Photosensitive resin composition, and pattern formation method using the same'20128,268,270'Coating solution for forming a light-absorbing layer of a chalcopyrite solar cell, method of producing a light-absorbing layer of a chalcopyrite solar cell, method of producing a chalcopyrite solar cell and method of producing a coating solution for forming a light-absorbing layer of a chalcopyrite solar cell'20128,187,408'Method of forming precision microspace, process for manufacturing member with precision microspace, and photosensitive laminated film'20128,163,836'Adhesive composition and adhesive film'20128,148,457'Adhesive composition and film adhesive'20128,124,685'Adhesive composition and film adhesive'20128,088,448'Heat treatment method'20127,999,052'Process for producing an adhesive composition'20117,977,030'Photosensitive resin composition, photosensitive resin laminate, and method for pattern forming'20117,951,522'Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal'20117,927,778'Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal'20117,871,758'Process for producing resist pattern and conductor pattern'20117,754,416'Process for producing resist pattern and conductor pattern'20107,268,061'Substrate attaching method'20077,169,532'Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal'20077,081,327'Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2020Patents assigned to TOKYO OHKA KOGYO CO LTD (38)· patent assignee history
2006–2020Based in Kawasaki, JP· patent location history
2007–2015Based in Kanagawa, JP· patent location history
2011Based in Kawsaki, JP· patent location history
2012–2016Patents assigned to MISUMI KOICHI (21)· patent assignee history
2012–2014Patents assigned to ASAI TAKAHIRO (8)· patent assignee history
2012–2014Patents assigned to IMAI HIROFUMI (5)· patent assignee history
2012–2016Patents assigned to MIYAMOTO HIDENORI (5)· patent assignee history
2012–2015Based in Hillsboro, OR, US· patent location history
2013Based in Kawasaski, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 38 | 2006–2020 |
| MISUMI KOICHIself | 21 | 2012–2016 |
| ASAI TAKAHIRO | 8 | 2012–2014 |
| IMAI HIROFUMI | 5 | 2012–2014 |
| MIYAMOTO HIDENORI | 5 | 2012–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 28 | 2006–2020 |
| Kanagawa, JP | 7 | 2007–2015 |
| Hillsboro, OR, US | 3 | 2012–2015 |
| Kawasaski, JP | 1 | 2013 |
| Kawsaki, JP | 1 | 2011 |