Inventor
KUAN-WEN LIN
Inventor
TW
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B08Bprimary
B08BCleaning in general19%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
H01LSemiconductor devices19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
G01BMeasuring length, thickness or similar linear dimensions8%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
H05HPlasma technique8%
PatentTitleYear
12,393,129Method and device for cleaning substrates202512,320,782Acoustic measurement of fabrication equipment clearance202512,085,866Particle removing assembly and method of cleaning mask for lithography202412,032,302Method and device for cleaning substrates202411,709,153Acoustic measurement of fabrication equipment clearance202311,698,592Particle removing assembly and method of cleaning mask for lithography202311,430,671Ozone wafer cleaning module having an ultraviolet lamp module with rotatable reflectors202211,294,292Particle removing assembly and method of cleaning mask for lithography2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (8)· patent assignee history
2022–2025Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 8 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 8 | 2022–2025 |