Inventor
TOMOHIRO YORISUE
Inventor
JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds23%
C08LCompositions of macromolecular compounds23%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients8%
H01LSemiconductor devices8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
11,809,079Photosensitive resin composition, polyimide production method, and semiconductor device202311,640,112Photosensitive resin composition and method for producing cured relief pattern202311,163,234Photosensitive resin composition and method for producing cured relief pattern2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2023Patents assigned to ASAHI CHEMICAL IND (3)· patent assignee history
2021–2023Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASAHI CHEMICAL IND | 3 | 2021–2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 3 | 2021–2023 |