Inventor

Seung-Wook Shin

Inventor
Uiwang-si, KR

Overview

5→
Patents
2011–2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
C07CAcyclic or carbocyclic compounds23%
C07DHeterocyclic compounds8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2019Patents assigned to CHEIL IND INC (5)· patent assignee history
2011–2019Based in Uiwang-si, KR· patent location history
2017Patents assigned to CHOI YOO-JEONG (1)· patent assignee history
2017Patents assigned to HONG SEUNG-HEE (1)· patent assignee history
2017Based in Suwon-si, KR· patent location history
2019Patents assigned to CHOI YOO JEONG (1)· patent assignee history
2019Patents assigned to HONG SEUNG HEE (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CHEIL IND INC52011–2019
CHOI YOO JEONG12019
CHOI YOO-JEONG12017
HONG SEUNG HEE12019
HONG SEUNG-HEE12017
Locations
LocationPatentsSpan
Uiwang-si, KR42011–2019
Suwon-si, KR12017