Inventor

Kaustuve Bhattacharyya

Inventor

Veldhoven, NL

Overview

34→

Patents

2008–2021

Patent span

Physics

Primary field (CPC G)

Patents· 34 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%

G01BMeasuring length, thickness or similar linear dimensions14%

G01NInvestigating or analysing materials by determining their chemical or physical properties13%

H01LSemiconductor devices7%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein2%

G06TImage data processing or generation, in general2%

A01GHorticulture1%

A01HNew plants or non-transgenic processes for obtaining them1%

PatentTitleYear

11,106,142Metrology recipe selection2021 11,022,896Mark position determination method2021 10,996,570Metrology method, patterning device, apparatus and computer program2021 10,908,513Metrology method and apparatus and computer program2021 10,901,330Recipe selection based on inter-recipe consistency2021 10,884,342Method and apparatus for predicting performance of a metrology system2021 10,866,527Methods and apparatus for monitoring a lithographic manufacturing process2020 10,845,707Determination of stack difference and correction using stack difference2020 10,831,109Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method2020 10,831,111Metrology method and lithographic method, lithographic cell and computer program2020 10,809,628Method of designing metrology targets, substrates having metrology targets, method of measuring overlay, and device manufacturing method2020 10,718,604Metrology method, target and substrate2020 10,698,322Metrology method, computer product and system2020 10,656,533Metrology in lithographic processes2020 10,635,004Correction using stack difference2020 10,527,953Metrology recipe selection2020 10,527,949Metrology method, computer product and system2020 10,481,499Determination of stack difference and correction using stack difference2019 10,451,978Metrology parameter determination and metrology recipe selection2019 10,394,137Inspection method, lithographic apparatus, mask and substrate2019 10,386,176Metrology method, target and substrate2019 10,345,709Determination of stack difference and correction using stack difference2019 10,338,484Recipe selection based on inter-recipe consistency2019 10,078,268Determination of stack difference and correction using stack difference2018 10,025,199Method of designing metrology targets, substrates having metrology targets, method of measuring overlay, and device manufacturing method2018 10,001,711Inspection method, lithographic apparatus, mask and substrate2018 9,714,827'Metrology method and apparatus, lithographic system, device manufacturing method and substrate'2017 9,494,872'Inspection method for lithography'2016 9,331,022'Substrate and patterning device for use in metrology, metrology method and device manufacturing method'2016 9,223,227'Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method'2015 9,163,935'Device manufacturing method and associated lithographic apparatus, inspection apparatus, and lithographic processing cell'2015 8,908,147'Method and apparatus for determining an overlay error'2014 8,709,687'Substrate and patterning device for use in metrology, metrology method and device manufacturing method'2014 7,457,454'Detailed grey scale inspection method and apparatus'2008

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2008Based in Schenectady, NY, US· patent location history

2014–2021Patents assigned to ASML NETHERLANDS BV (33)· patent assignee history

2014–2016Patents assigned to BHATTACHARYYA KAUSTUVE (4)· patent assignee history

2014–2016Patents assigned to DEN BOEF ARIE JEFFREY (3)· patent assignee history

2014–2016Patents assigned to VAN DER SCHAAR MAURITS (3)· patent assignee history

2014Patents assigned to KUBIS MICHAEL (2)· patent assignee history

2014–2021Based in Veldhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ASML NETHERLANDS BV	33	2014–2021
BHATTACHARYYA KAUSTUVEself	4	2014–2016
DEN BOEF ARIE JEFFREY	3	2014–2016
VAN DER SCHAAR MAURITS	3	2014–2016
KUBIS MICHAEL	2	2014

Locations

Location	Patents	Span
Veldhoven, NL	33	2014–2021
Schenectady, New York, US	1	2008