Inventor

Minoru Hanazaki

Inventor
Hyogo, JP

Overview

18→
Patents
1988–2010
Patent span
Electricity
Primary field (CPC H)

Patents· 18 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
C23CCoating metallic material10%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients7%
Y10TTechnical subjects covered by former us classification7%
B82YSpecific uses or applications of nanostructures5%
C01FCompounds of the metals beryllium, magnesium, aluminium, calcium, strontium, barium, radium, thorium, or of the rare-earth metals5%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds5%
C08LCompositions of macromolecular compounds5%
H05HPlasma technique5%
PatentTitleYear
7,790,478'Manufacturing method of semiconductor integrated circuit device'20106,929,712'Plasma processing apparatus capable of evaluating process performance'20056,864,982'Gas analyzing method and gas analyzer for semiconductor treater'20056,416,618'Wafer processing apparatus'20026,287,980'Plasma processing method and plasma processing apparatus'20016,273,023'Plasma processing apparatus capable of reliably, electrostatically attracting and holding and thus fixing semiconductor wafer'20016,218,196'Etching apparatus, etching method, manufacturing method of a semiconductor device, and semiconductor device'20016,109,208'Plasma generating apparatus with multiple microwave introducing means'20006,054,016'Magnetically enhanced microwave plasma generating apparatus'20006,033,780'Fine particles of petaloid porous hydroxyapatite and process for producing the same'20006,024,105'Semiconductor manufacturing device and method of removing particles therefrom'20005,976,687'Additive for synthetic resins and a synthetic resin composition'19995,844,022'Additive for synthetic resins and synthetic resin compositions'19985,494,651'Method for manufacturing monodisperse vaterite type calcium carbonate'19965,275,651'Monodisperse vaterite type calcium carbonate, its manufacturing method and method of controlling growth of particles and shape thereof'19944,947,085'Plasma processor'19904,894,510'Apparatus for uniformly distributing plasma over a substrate'19904,725,318'Filler for paper-making and neutral paper-making process by the use thereof'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988–2000Patents assigned to MARUO CALCIUM (6)· patent assignee history
1988Based in Kobe, JP· patent location history
1990–2002Patents assigned to MITSUBISHI ELECTRIC CORP (9)· patent assignee history
1990Based in Amagasaki, JP· patent location history
1994–1996Based in Kakogawa, JP· patent location history
1998–2005Based in Hyogo, JP· patent location history
2000–2005Patents assigned to MITSUBISHI ELECTRIC ENG (5)· patent assignee history
2000–2010Based in Tokyo, JP· patent location history
2002Patents assigned to MITSUBISHI DENKI ENGINEERING C (1)· patent assignee history
2005–2010Patents assigned to RENESAS TECH CORP (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI ELECTRIC CORP91990–2002
MARUO CALCIUM61988–2000
MITSUBISHI ELECTRIC ENG52000–2005
RENESAS TECH CORP32005–2010
MITSUBISHI DENKI ENGINEERING C12002
Locations
LocationPatentsSpan
Hyogo, JP81998–2005
Tokyo, JP52000–2010
Kakogawa, JP21994–1996
Amagasaki, JP21990
Kobe, JP11988