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Inventor

MASAYOSHI IMAI

Inventor
JP

Overview

3→
Patents
2022–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
B05BSpraying apparatus11%
B08BCleaning in general11%
B24BMachines, devices, or processes for grinding or polishing11%
PatentTitleYear
12,463,062Substrate processing apparatus, computer-readable storage medium storing a program, and substrate processing method202511,848,216Cleaning apparatus for cleaning member, substrate cleaning apparatus and cleaning member assembly202311,495,475Method of cleaning a substrate2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2025Patents assigned to EBARA CORP (3)· patent assignee history
2022–2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP32022–2025
Locations
LocationPatentsSpan
JP32022–2025