Inventor

Isao Ono

Inventor

Hachioji, JP

Overview

1976–2005

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Jprimary

B01JChemical or physical processes, e.g. catalysis or colloid chemistry15%

C07CAcyclic or carbocyclic compounds15%

B05BSpraying apparatus10%

B05CApparatus for applying fluent materials to surfaces, in general10%

B41MPrinting, duplicating, marking, or copying processes10%

B28BShaping clay or other ceramic compositions5%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%

C08LCompositions of macromolecular compounds5%

D21HPulp compositions5%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1976–1977Patents assigned to ROHM & HAAS (3)· patent assignee history

1976–1977Based in Yamaguchi, JP· patent location history

1979Patents assigned to ASAHI GLASS CO LTD (1)· patent assignee history

1987–1992Patents assigned to KURARAY CO (2)· patent assignee history

1987Patents assigned to JAPAN BROADCASTING CORP (1)· patent assignee history

1987Based in Asakuchi-gun, JP· patent location history

1992Based in Okayama, JP· patent location history

1999Patents assigned to NIRECO CORP (2)· patent assignee history

1999Based in Hachioji, JP· patent location history

2005Based in Kanagawa, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations