Inventor

Remco Dirks

Inventor
Deurne, NL

Overview

5→
Patents
2014–2020
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices45%
G06FElectric digital data processing18%
G01BMeasuring length, thickness or similar linear dimensions9%
G01NInvestigating or analysing materials by determining their chemical or physical properties9%
H01LSemiconductor devices9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2020Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2014Patents assigned to DIRKS REMCO (2)· patent assignee history
2014Patents assigned to SETIJA IRWAN DANI (2)· patent assignee history
2014Patents assigned to VAN BEURDEN MARTIJN CONSTANT (2)· patent assignee history
2014Patents assigned to VAN KRAAIJ MARKUS GERARDUS MARTINUS MARIA (1)· patent assignee history
2014–2020Based in Deurne, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV52014–2020
DIRKS REMCOself22014
SETIJA IRWAN DANI22014
VAN BEURDEN MARTIJN CONSTANT22014
VAN KRAAIJ MARKUS GERARDUS MARTINUS MARIA12014
Locations
LocationPatentsSpan
Deurne, NL52014–2020