Inventor
Shinji Maekawa
Inventor
Kanagawa, JP
Overview
Patents· 115 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
H10KOrganic electric solid-state devices10%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein10%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
G09GArrangements or circuits for control of indicating devices using static means to present variable information4%
H01LSemiconductor devices3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
H05KPrinted circuits3%
H10HInorganic light-emitting semiconductor devices having potential barriers3%
PatentTitleYear
10,957,592Through electrode substrate, method of manufacturing through electrode substrate, and mounting substrate202110,755,996Through electrode substrate and manufacturing method thereof202010,681,256Image sensor module including a light-transmissive interposer substrate having a through-hole20209,683,706'Cylinder valve'20179,362,410'Semiconductor device, manufacturing method thereof, and display device'20169,237,657'Wiring substrate, semiconductor device, and method for manufacturing thereof'20169,219,157'Semiconductor device, manufacturing method thereof, and display device'20159,202,728'Substrate mounting mechanism, and substrate processing apparatus'20159,176,073'Evaluation substrate, defect examination method and defect detection device'20159,123,625'Display device'20158,997,570'High impact resistant acceleration sensor'20158,987,068'Method for manufacturing display device'20158,912,546'Thin film transistor and display device'20148,742,421'Display device, method for manufacturing the same, and television apparatus'20148,717,269'Display device'20148,637,397'Method for manufacturing a through hole electrode substrate'20148,629,442'Display device'20148,624,252'Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and el television'20148,619,219'Thin film transistor, display device and liquid crystal display device and method for manufacturing the same'20138,575,696'Semiconductor device, manufacturing method thereof, and display device'20138,575,618'Electronic device, semiconductor device and manufacturing method thereof'20138,570,630'Piezoelectric mirror device, optical equipment incorporating the same, and piezoelectric mirror device fabrication process'20138,563,438'Method for manufacturing semiconductor device'20138,547,315'Display device'20138,539,655'Fabrication process for a piezoelectric mirror device'20138,535,965'Silicon nitride film, a semiconductor device, a display device and a method for manufacturing a silicon nitride film'20138,518,760'Display device, method for manufacturing thereof, and television device'20138,461,013'Semiconductor device and method for manufacturing the same'20138,455,335'Manufacturing method of semiconductor device'20138,445,901'Manufacturing method of semiconductor device'20138,322,847'Liquid droplet ejection system and control program of ejection condition of compositions'20128,310,474'Display device'20128,300,290'Piezoelectric mirror device, optical equipment incorporating the same, and piezoelectric mirror device fabrication process'20128,293,457'Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and EL television'20128,288,772'Through hole electrode substrate with different area weighted average crystal grain diameter of metal in the conductive part and semiconductor device using the through hole electrode substrate'20128,283,216'Liquid crystal display device and method for manufacturing the same'20128,278,204'Methods for forming wiring and manufacturing thin film transistor and droplet discharging method'20128,263,983'Wiring substrate and semiconductor device'20128,247,814'Active matrix display device including a metal oxide semiconductor film'20128,247,965'Light emitting display device and method for manufacturing the same'20128,227,294'Manufacturing method of semiconductor device'20128,228,453'Thin film transistor, display device and liquid crystal display device and method for manufacturing the same'20128,228,277'Display device'20128,227,805'Silicon nitride film, a semiconductor device, a display device and a method for manufacturing a silicon nitride film'20128,207,533'Electronic device, semiconductor device and manufacturing method thereof'20128,132,458'Acceleration sensor resistant to excessive force breakage'20128,102,347'Display device'20128,101,467'Liquid crystal display device and method for manufacturing the same, and liquid crystal television receiver'20128,053,171'Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and EL television'20118,003,420'Display device provided with semiconductor element and manufacturing method thereof, and electronic device installed with display device provided with semiconductor element'20117,993,993'Display device, manufacturing method thereof, and television receiver'20117,989,272'Composition of carbon nitride, thin film transistor with the composition of carbon nitride, display device with the thin film transistor, and manufacturing method thereof'20117,968,461'Method for forming wiring, method for manufacturing thin film transistor and droplet discharging method'20117,964,452'Liquid crystal display device and method for manufacturing the same'20117,939,888'Display device and television device using the same'20117,939,822'Active matrix display device'20117,897,968'Electronic device and semiconductor device and method for manufacturing the same'20117,883,912'Display device and method for manufacturing the same'20117,875,542'Methods for forming wiring and manufacturing thin film transistor and droplet discharging method'20117,868,957'Thin film transistor, display device and liquid crystal display device and method for manufacturing the same'20117,863,114'Manufacturing method of semiconductor device'20117,858,451'Electronic device, semiconductor device and manufacturing method thereof'20107,859,187'Display device and method for fabricating the same'20107,800,113'Method for manufacturing display device'20107,795,616'Liquid crystal display device and method for manufacturing the same'20107,759,735'Display device provided with semiconductor element and manufacturing method thereof, and electronic device installed with display device provided with semiconductor element'20107,732,248'Manufacturing method of semiconductor device'20107,733,315'Display device'20107,732,818'Display device, manufacturing method thereof, and television receiver'20107,727,854'Manufacturing method of semiconductor device'20107,709,843'Display device and method for manufacturing the same, and television receiver'20107,696,100'Method for manufacturing semiconductor device'20107,691,685'Method for manufacturing semiconductor device'20107,687,326'Semiconductor device and manufacturing method thereof'20107,648,861'Method of fabricating a semiconductor device including separately forming a second semiconductor film containing an impurity element over the first semiconductor region'20107,615,488'Method for forming pattern, thin film transistor, display device and method for manufacturing the same, and television device'20097,601,994'Display device and method for manufacturing the same'20097,575,965'Method for forming large area display wiring by droplet discharge, and method for manufacturing electronic device and semiconductor device'20097,572,688'Method for manufacturing semiconductor device'20097,564,058'Display device, manufacturing method thereof, and television set'20097,557,412'Semiconductor device and method of manufacturing the same'20097,511,709'Display device'20097,501,653'Method of manufacturing semiconductor device having a circuit including thin film transistors'20097,499,117'Liquid crystal display device and manufacturing method thereof'20097,492,338'Display device'20097,491,590'Method for manufacturing thin film transistor in display device'20097,477,216'Display device and electronic apparatus'20097,439,086'Method for manufacturing liquid crystal display device'20087,399,704'Fabrication method of a semiconductor device using liquid repellent film'20087,393,081'Droplet jetting device and method of manufacturing pattern'20087,374,976'Method for fabricating thin film transistor'20087,365,805'Display device, manufacturing method thereof, and television receiver'20087,354,808'Resist composition and method for manufacturing semiconductor device using the same'20087,335,255'Manufacturing method of semiconductor device'20087,332,431'Method of manufacturing semiconductor device'20087,274,038'Silicon nitride film, a semiconductor device, a display device and a method for manufacturing a silicon nitride film'20077,273,773'Display device, method for manufacturing thereof, and television device'20077,247,529'Method for manufacturing display device'20077,232,742'Method of manufacturing a semiconductor device that includes forming a material with a high tensile stress in contact with a semiconductor film to getter impurities from the semiconductor film'20077,229,862'Method for manufacturing semiconductor device'20077,226,819'Methods for forming wiring and manufacturing thin film transistor and droplet discharging method'20077,223,641'Semiconductor device, method for manufacturing the same, liquid crystal television and EL television'20077,214,986'Semiconductor device, manufacturing method thereof, and display device'20077,211,476'Semiconductor device and method of manufacturing the same'20077,211,454'Manufacturing method of a light emitting device including moving the source of the vapor deposition parallel to the substrate'20077,111,818'Safety valve'20066,953,717'Method of manufacturing semiconductor device'20056,917,079'Thin film transistor and method of manufacturing the same'20056,897,477'Semiconductor device, manufacturing method thereof, and display device'20056,861,338'Thin film transistor and method of manufacturing the same'20056,830,994'Method of manufacturing a semiconductor device having a crystallized semiconductor film'20046,809,023'Method of manufacturing semiconductor device having uniform crystal grains in a crystalline semiconductor film'20046,766,829'Valve assembly for gas cylinder'20046,518,104'Method of manufacturing a semiconductor device by thermal oxidation of an impurity doped amorphous semiconductor film'20036,261,971'Method of manufacturing a semiconductor device by thermal oxidation of amorphous semiconductor film'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2016Patents assigned to SEMICONDUCTOR ENERGY LAB (99)· patent assignee history
2001–2016Based in Kanagawa, JP· patent location history
2003–2013Based in Atsugi, JP· patent location history
2008–2015Based in Shizuoka, JP· patent location history
2012–2016Patents assigned to MAEKAWA SHINJI (38)· patent assignee history
2012–2014Patents assigned to YAMAZAKI SHUNPEI (13)· patent assignee history
2012–2021Patents assigned to DAINIPPON PRINTING CO LTD (11)· patent assignee history
2012–2014Patents assigned to NAKAMURA OSAMU (8)· patent assignee history
2012–2021Based in Tokyo, JP· patent location history
2012–2015Based in Shinjuku-ku, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEMICONDUCTOR ENERGY LAB | 99 | 2001–2016 |
| MAEKAWA SHINJIself | 38 | 2012–2016 |
| YAMAZAKI SHUNPEI | 13 | 2012–2014 |
| DAINIPPON PRINTING CO LTD | 11 | 2012–2021 |
| NAKAMURA OSAMU | 8 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 53 | 2001–2016 |
| Shizuoka, JP | 31 | 2008–2015 |
| Atsugi, JP | 14 | 2003–2013 |
| Tokyo, JP | 6 | 2012–2021 |
| Shinjuku-ku, JP | 5 | 2012–2015 |