Inventor
HSIANG-MING CHANG
Inventor
TW
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
H01JElectric discharge tubes or discharge lamps13%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
H10DInorganic electric semiconductor devices6%
PatentTitleYear
12,482,654System and method for multiple step directional patterning202512,476,150Critical dimension uniformity (CDU) control method and semiconductor substrate processing system202512,354,873System and method for multiple step directional patterning202512,027,368Method for fabricating semiconductor device2024Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2024–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (4)· patent assignee history
2024–2025Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 4 | 2024–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 4 | 2024–2025 |