Inventor
Hisashi Fukuda
Inventor
Tokyo, JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
H01JElectric discharge tubes or discharge lamps17%
H04MTelephonic communication11%
H04QSelecting11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
G03GElectrography6%
G06FElectric digital data processing6%
H04LTransmission of digital information, e.g. telegraphic communication6%
H10DInorganic electric semiconductor devices6%
PatentTitleYear
10,841,087Security device, system, and security method20208,228,905'CTI control system'20126,760,322'CTI Control System'20045,198,392'Method of forming a nitrided silicon dioxide (SiO.sub.x N.sub.y) film'19935,009,926'Method of forming an insulating film'19914,946,706'Method of ion implantation'19904,892,752'Method of ion implantation'19904,871,416'Method and device for cleaning substrates'19894,664,999'Method of making electrophotographic member with a-Si photoconductive layer'1987Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1987–1993Patents assigned to OKI ELECTRIC IND CO LTD (6)· patent assignee history
1987–2020Based in Tokyo, JP· patent location history
2004–2012Patents assigned to FUJITSU LTD (2)· patent assignee history
2004–2012Based in Kanagawa, JP· patent location history
2012Patents assigned to FUKUDA HISASHI (1)· patent assignee history
2012Patents assigned to MATSUNE HIDEAKI (1)· patent assignee history
2020Patents assigned to MITSUBISHI ELECTRIC CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| OKI ELECTRIC IND CO LTD | 6 | 1987–1993 |
| FUJITSU LTD | 2 | 2004–2012 |
| FUKUDA HISASHIself | 1 | 2012 |
| MATSUNE HIDEAKI | 1 | 2012 |
| MITSUBISHI ELECTRIC CORP | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 7 | 1987–2020 |
| Kanagawa, JP | 2 | 2004–2012 |