Inventor

DAEHOON PARK

Inventor
KR

Overview

1→
Patents
2025
Patent span
Performing operations
Primary field (CPC B)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary
B01DSeparation17%
B05DProcesses for applying fluent materials to surfaces, in general17%
B81BMicrostructural devices or systems, e.g. micromechanical devices17%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems17%
B82BNanostructures formed by manipulation of individual atoms, molecules, or limited collections of atoms or molecules as discrete units17%
B82YSpecific uses or applications of nanostructures17%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025Patents assigned to POSTECH RES & BUSINESS DEV FOUND (1)· patent assignee history
2025Patents assigned to SAMSUNG ELECTRONICS CO LTD (1)· patent assignee history
2025Based in KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
POSTECH RES & BUSINESS DEV FOUND12025
SAMSUNG ELECTRONICS CO LTD12025
Locations
LocationPatentsSpan
KR12025