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Inventor

Norio Tokuda

Inventor
Kanazawa, JP

Overview

7→
Patents
2011–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices23%
H10DInorganic electric semiconductor devices23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
C30BSingle-crystal growth18%
C23CCoating metallic material9%
H10HInorganic light-emitting semiconductor devices having potential barriers5%
PatentTitleYear
11,066,757Diamond substrate and freestanding diamond substrate202110,253,426Method for manufacturing diamond substrate201910,100,435Method for manufacturing diamond substrate20189,711,638'Semiconductor device using diamond'20179,136,400'Semiconductor device'20158,592,824'High efficiency indirect transition semiconductor ultraviolet light emitting device'20137,989,260'Method of selectively forming atomically flat plane on diamond surface, diamond substrate produced by the method, and semiconductor device using the same'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2015Patents assigned to NAT INST OF ADVANCED IND SCIEN (3)· patent assignee history
2011–2013Based in Ibaraki, JP· patent location history
2013–2015Patents assigned to KATO HIROMITSU (2)· patent assignee history
2015Based in Tsukuba, JP· patent location history
2017–2021Based in Kanazawa, JP· patent location history
2018–2021Patents assigned to AIST (3)· patent assignee history
2018–2021Patents assigned to SHINETSU CHEMICAL CO (3)· patent assignee history
2018–2021Patents assigned to UNIV NAT CORP KANAZAWA (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
AIST32018–2021
NAT INST OF ADVANCED IND SCIEN32011–2015
SHINETSU CHEMICAL CO32018–2021
UNIV NAT CORP KANAZAWA32018–2021
KATO HIROMITSU22013–2015
Locations
LocationPatentsSpan
Kanazawa, JP42017–2021
Ibaraki, JP22011–2013
Tsukuba, JP12015