Inventor
ZHIWEN WAN
Inventor
US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
B05DProcesses for applying fluent materials to surfaces, in general11%
C01BNon-metallic elements11%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds11%
C09DCoating compositions, e.g. paints, varnishes or lacquers11%
H01LSemiconductor devices11%
C04BLime, magnesia5%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium5%
PatentTitleYear
12,368,042Precursors and processes for deposition of Si-containing films using ALD at temperature of 550deg C. or higher202512,173,403Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films202411,739,220Perhydropolysilazane compositions and methods for forming oxide films using same202311,203,528N--H free and Si-rich per-hydridopolysilzane compositions, their synthesis, and applications2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to AIR LIQUIDE (4)· patent assignee history
2021–2023Patents assigned to AIR LIQUIDE AMERICAN (2)· patent assignee history
2021–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AIR LIQUIDE | 4 | 2021–2025 |
| AIR LIQUIDE AMERICAN | 2 | 2021–2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 4 | 2021–2025 |