Inventor

Hiroya Kobayashi

Inventor
Hamamatsu, JP

Overview

30→
Patents
1982–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 30 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Fprimary
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
H04NPictorial communication, e.g. television11%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
Y10TTechnical subjects covered by former us classification5%
H01BCables4%
C04BLime, magnesia2%
G02BOptical elements, systems or apparatus2%
G06TImage data processing or generation, in general2%
PatentTitleYear
10,199,418Semiconductor photodetection device20199,401,381'Solid-state image pickup device'20168,947,587'Imaging device holding structure and imaging device'20158,533,376'Data processing method, data processing apparatus and robot'20138,243,175'Solid-state imaging device'20128,188,417'Light detecting device'20128,142,573'R-T-B sintered magnet and method for producing the same'20128,110,802'Photodetecting device including base with positioning portion'20128,094,221'Solid-state imaging device'20127,696,595'Semiconductor device and method for manufacturing the same'20107,612,442'Semiconductor device'20097,605,455'Semiconductor device'20097,556,975'Method for manufacturing backside-illuminated optical sensor'20097,550,811'Image pickup device and method of manufacturing the same'20097,545,015'Photo-detection device and manufacturing method thereof'20096,351,439'Method and system for managing access to data through data transformation'20026,084,059'Production process for organometallic fine particle and catalyst for polymerization'20006,034,931'Method of recording media data on a storage medium and method and system for accessing the media data recorded on the storage medium'20005,973,104'High molecular polyetherpolyester and its production process and use'19995,843,573'Polyester resin composition'19985,747,602'Production process for making high molecular weight polydioxolane'19985,616,681'Process for producing aliphatic polyester'19975,391,700'Process for producing polyester by ring-opening copolymerization'19955,296,650'Method for waterproofing with a cross-linked macromolecular waterproofing agent'19945,213,893'Waterproofing agent for cable'19935,190,815'Waterproofing tape comprising ethylenic sulfonate polymers'19935,137,945'Cement with sulfoalkyacrylate polymers'19924,872,885'Dispersant for aqueous slurry of carbonaceous solid and aqueous carbonaceous solid slurry composition incorporating said dispersant therein'19894,870,120'Cement dispersant'19894,337,154'Crosslinked composite semipermeable membrane'1982

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1982–2000Patents assigned to NIPPON CATALYTIC CHEM IND (11)· patent assignee history
1982–2000Based in Minoo, JP· patent location history
1989–1992Based in Minoh, JP· patent location history
1993–2012Based in Osaka, JP· patent location history
2000–2002Based in Machida, JP· patent location history
2009–2019Patents assigned to HAMAMATSU PHOTONICS KK (13)· patent assignee history
2009–2019Based in Hamamatsu, JP· patent location history
2012–2015Patents assigned to KOBAYASHI HIROYA (7)· patent assignee history
2012–2015Patents assigned to MURAMATSU MASAHARU (5)· patent assignee history
2012–2015Patents assigned to MIYAZAKI YASUHITO (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HAMAMATSU PHOTONICS KK132009–2019
NIPPON CATALYTIC CHEM IND111982–2000
KOBAYASHI HIROYAself72012–2015
MURAMATSU MASAHARU52012–2015
MIYAZAKI YASUHITO32012–2015
Locations
LocationPatentsSpan
Hamamatsu, JP132009–2019
Minoo, JP81982–2000
Osaka, JP41993–2012
Machida, JP22000–2002
Minoh, JP21989–1992