Inventor

CHING-YU CHANG

Inventor

TW

Overview

2021–2026

Patent span

Electricity

Primary field (CPC H)

Patents· 140 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%

H01LSemiconductor devices24%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%

H10DInorganic electric semiconductor devices5%

C09DCoating compositions, e.g. paints, varnishes or lacquers3%

C08LCompositions of macromolecular compounds2%

C23CCoating metallic material2%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds1%

C11DDetergent compositions1%

PatentTitleYear

12,578,641Photoresist and method of manufacturing a semiconductor device2026 12,578,640Photosensitive material for photoresist and lithography2026 12,578,645Method of manufacturing a semiconductor device2026 12,566,374Photoresist composition and method of manufacturing semiconductor device2026 12,557,572Method for manufacturing a semiconductor device2026 12,550,685Protective composition and method of forming photoresist pattern2026 12,547,075Method of forming photoresist pattern2026 12,541,149Resist dispensing system and method of use2026 12,535,739Method of forming photoresist pattern2026 12,535,738Photoresist top coating material for etching rate control2026 12,532,687Cleaning solution and method of cleaning wafer2026 12,510,821Photoresist composition and method of forming photoresist pattern2025 12,504,693Photoresist composition and method of manufacturing a semiconductor device2025 12,500,084Semiconductor manufacturing apparatus and method of manufacturing semiconductor device2025 12,487,527Photoresist developer and method of developing photoresist2025 12,476,107Method of manufacturing a semiconductor device2025 12,476,210Bump structure and method of manufacturing bump structure2025 12,469,692Cleaning solution and method of cleaning wafer2025 12,463,034Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern2025 12,437,992Method of manufacturing a semiconductor device2025 12,436,458Photoresist composition and method of forming photoresist pattern2025 12,400,875Film deposition for patterning process2025 12,379,659Photoresist composition and method of manufacturing a semiconductor device2025 12,374,639Non-DMSO stripper for advance package metal plating process2025 12,360,456EUV metallic resist performance enhancement via additives2025 12,354,874Method of manufacturing semiconductor devices and pattern formation method2025 12,347,727Treatment of spin on organic material to improve wet resistance2025 12,347,683Method of manufacturing a semiconductor device2025 12,341,011Method for forming and using mask2025 12,322,590Semiconductor device and method2025 12,315,726Semiconductor device and method2025 12,300,507Method of manufacturing a semiconductor device2025 12,300,487Photoresist composition and method of forming photoresist pattern2025 12,292,684Adhesion layer for multi-layer photoresist2025 12,272,554Method of manufacturing a semiconductor device2025 12,271,113Method of manufacturing a semiconductor device2025 12,253,800EUV metallic resist performance enhancement via additives2025 12,249,507Method of manufacturing a semiconductor device2025 12,222,650Photoresist underlayer and method of manufacturing a semiconductor device2025 12,222,643Method of manufacturing a semiconductor device and pattern formation method2025 12,222,647Photoresist composition and method of forming photoresist pattern2025 12,222,654Lithography method for positive tone development2025 12,222,653Method for forming semiconductor structure2025 12,217,971Method for forming semiconductor device2025 12,211,698Method composition and methods thereof2025 12,210,286Metal-compound-removing solvent and method in lithography2025 12,210,283EUV photoresist with low-activation-energy ligands or high-developer-solubility ligands2025 12,189,296Lithography process and material for negative tone development2025 12,189,287Photoresist composition and method of forming photoresist pattern2025 12,189,293Method of manufacturing a semiconductor device2025 12,181,798Extreme ultraviolet photolithography method with developer composition2024 12,174,540Method of manufacturing a semiconductor device2024 12,159,787Method of manufacturing a semiconductor device and pattern formation method2024 12,148,610Spin on carbon composition and method of manufacturing a semiconductor device2024 12,135,501Method of manufacturing a semiconductor device2024 12,134,690Photoresist composition and method of manufacturing a semiconductor device2024 12,135,502Resin, photoresist composition, and method of manufacturing semiconductor device2024 12,106,961Humidity control or aqueous treatment for EUV metallic resist2024 12,085,855Resin, photoresist composition, and method of manufacturing semiconductor device2024 12,087,644Methods of determining process recipes and forming a semiconductor device2024 12,087,616Air gap formation method2024 12,074,058Patterning methods for semiconductor devices2024 12,074,027Underlayer of multilayer structure and methods of use thereof2024 12,074,025Photoresist developer and method of developing photoresist2024 12,057,315Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern2024 12,050,404Photoresist with polar-acid-labile-group2024 12,025,920Lithography techniques for reducing defects2024 12,019,375Photosensitive material and method of lithography2024 12,009,210Method of manufacturing a semiconductor device2024 12,002,710Semiconductor structure and methods of forming the same2024 11,984,316Porogen bonded gap filling material in semiconductor manufacturing2024 11,971,659Photoresist composition and method of forming photoresist pattern2024 11,971,657Photoresist developer and method of developing photoresist2024 D1024352Bio particle application device2024 11,966,162Photoresist composition and method of manufacturing a semiconductor device2024 11,955,336Method of manufacturing a semiconductor device2024 11,948,798Semiconductor device and method2024 11,942,322Method of manufacturing semiconductor devices and pattern formation method2024 11,934,101Photoresist composition and method of forming photoresist pattern2024 11,935,757Method of manufacturing a semiconductor device2024 11,923,326Bump structure and method of manufacturing bump structure2024 11,914,301Photoresist, method of manufacturing a semiconductor device and method of extreme ultraviolet lithography2024 11,887,851Method for forming and using mask2024 11,886,121Method for forming patterned photoresist2024 11,876,054Overlay mark and method of making2024 11,854,798Semiconductor device and method2023 11,854,769Adjustable fastening device for plasma gas injectors2023 11,822,237Method of manufacturing a semiconductor device2023 11,822,251Photoresist with polar-acid-labile-group2023 11,822,238Extreme ultraviolet photolithography method with developer composition2023 11,796,918Underlayer material for photoresist2023 11,784,046Method of manufacturing a semiconductor device2023 11,782,345Bottom antireflective coating materials2023 11,774,855Lithography patterning technique2023 11,762,296Method and apparatus of patterning a semiconductor device2023 11,754,923Resist dispensing system and method of use2023 11,728,161Spin on carbon composition and method of manufacturing a semiconductor device2023 11,714,355Photoresist composition and method of forming photoresist pattern2023 11,708,495Priming material for substrate coating2023 11,703,766Materials and methods for forming resist bottom layer2023 11,705,332Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern2023 11,703,765Photoresist composition and method of manufacturing a semiconductor device2023 11,694,896Photoresist developer and method of developing photoresist2023 11,681,226Metal-compound-removing solvent and method in lithography2023 11,681,221EUV photoresist with low-activation-energy ligands or high-developer-solubility ligands2023 11,676,852Patterning methods for semiconductor devices2023 11,670,490Integrated circuit fabrication system with adjustable gas injector2023 11,658,120Porogen bonded gap filling material in semiconductor manufacturing2023 11,656,553Method for forming semiconductor structure2023 11,626,285Method of manufacturing a semiconductor device2023 11,626,293Method of manufacturing a semiconductor device2023 11,605,538Protective composition and method of forming photoresist pattern2023 11,581,217Method for forming vias and method for forming contacts in vias2023 11,550,220Negative tone photoresist for EUV lithography2023 11,495,460Method for forming semiconductor structure by patterning resist layer having inorganic material2022 11,482,411Semiconductor device and method2022 11,476,108Spin on carbon composition and method of manufacturing a semiconductor device2022 11,460,776Method and apparatus of patterning a semiconductor device2022 11,456,170Cleaning solution and method of cleaning wafer2022 11,456,266Bump structure and method of manufacturing bump structure2022 11,442,364Materials and methods for forming resist bottom layer2022 11,387,104Grafting design for pattern post-treatment in semiconductor manufacturing2022 11,378,884Extreme ultraviolet photoresist and method2022 11,361,943Adjustable fastening device for plasma gas injectors2022 11,355,318Adjustable fastening device for plasma gas injectors2022 11,351,509Filter with seal treatment2022 11,320,738Pattern formation method and material for manufacturing semiconductor devices2022 11,307,504Humidity control in EUV lithography2022 11,300,878Photoresist developer and method of developing photoresist2022 11,295,961Method of manufacturing a semiconductor device2022 11,287,740Photoresist composition and method of forming photoresist pattern2022 11,281,107Method for performing lithography process with post treatment2022 11,276,568Method for manufacturing a semiconductor device and a coating material2022 11,269,256Underlayer material for photoresist2022 11,262,659Method of cleaning extreme ultraviolet lithography collector2022 11,226,555Preparing patterned neutral layers and structures prepared using the same2022 11,215,924Photoresist, developer, and method of forming photoresist pattern2022 11,158,509Pattern fidelity enhancement with directional patterning technology2021 11,143,963Negative tone developer for extreme ultraviolet lithography2021 11,137,685Semiconductor method of protecting wafer from bevel contamination2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (139)· patent assignee history

2021–2026Based in TW· patent location history

2024Patents assigned to ACE MEDICAL TECH CO LTD (1)· patent assignee history

2024Patents assigned to TAIWAIN SEMICONDUCTOR MFG CO LTD (1)· patent assignee history

2025Patents assigned to TAIWAN SEMICONDUCTOR MANUFACURING COMPANY LTD (1)· patent assignee history

2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO TLD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TAIWAN SEMICONDUCTOR MFG CO LTD	139	2021–2026
ACE MEDICAL TECH CO LTD	1	2024
TAIWAIN SEMICONDUCTOR MFG CO LTD	1	2024
TAIWAN SEMICONDUCTOR MANUFACURING COMPANY LTD	1	2025
TAIWAN SEMICONDUCTOR MFG CO TLD	1	2025

Locations

Location	Patents	Span
TW	140	2021–2026