LexDanaLexDanabeta
Inventor

Sang-Ryol Yang

Inventor
Gyeonggi-do, KR

Overview

12→
Patents
2005–2015
Patent span
Electricity
Primary field (CPC H)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices33%
H10BElectronic memory devices27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
C23CCoating metallic material7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
B82YSpecific uses or applications of nanostructures3%
H01LSemiconductor devices3%
PatentTitleYear
8,970,039'Integrated circuit devices including electrode support structures and methods of fabricating the same'20158,815,697'Method of fabricating semiconductor device'20148,815,676'Three dimensional semiconductor memory device and method of fabricating the same'20148,445,367'Methods of manufacturing semiconductor devices'20138,330,207'Flash memory device including multilayer tunnel insulator and method of fabricating the same'20128,309,405'Three dimensional semiconductor memory device and method of fabricating the same'20127,951,671'Method of fabricating non-volatile memory device having separate charge trap patterns'20117,759,192'Semiconductor device including capacitor and method of fabricating same'20107,723,755'Semiconductor having buried word line cell structure and method of fabricating the same'20107,510,935'Method of manufacturing a charge-trapping dielectric and method of manufacturing a sonos-type non-volatile semiconductor device'20097,419,888'Method of forming a silicon-rich nanocrystalline structure by an atomic layer deposition process and method of manufacturing a non-volatile semiconductor device using the same'20086,962,876'Method for forming a low-k dielectric layer for a semiconductor device'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2015Patents assigned to SAMSUNG ELECTRONICS CO LTD (12)· patent assignee history
2005–2014Based in Suwon-si, KR· patent location history
2008–2015Based in Gyeonggi-do, KR· patent location history
2010–2013Based in Hwaseong-si, KR· patent location history
2012–2014Patents assigned to YANG SANG-RYOL (5)· patent assignee history
2012–2014Patents assigned to KIM JIN-GYUN (3)· patent assignee history
2012–2014Patents assigned to CHOI JI-HOON (2)· patent assignee history
2012–2013Patents assigned to HWANG KI-HYUN (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD122005–2015
YANG SANG-RYOLself52012–2014
KIM JIN-GYUN32012–2014
CHOI JI-HOON22012–2014
HWANG KI-HYUN22012–2013
Locations
LocationPatentsSpan
Gyeonggi-do, KR52008–2015
Hwaseong-si, KR42010–2013
Suwon-si, KR32005–2014