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Inventor

Kazunori Onizaki

Inventor
Saga, JP

Overview

4→
Patents
2001–2003
Patent span
Performing operations
Primary field (CPC B)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B28Dprimary
B28DWorking stone or stone-like materials27%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests18%
B23DPlaning9%
B24BMachines, devices, or processes for grinding or polishing9%
C30BSingle-crystal growth9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
Y02PClimate change mitigation technologies in the production or processing of goods9%
Y10TTechnical subjects covered by former us classification9%
PatentTitleYear
6,568,384'Semiconductor material cutting and processing method'20036,465,328'Semiconductor wafer manufacturing method'20026,283,111'Wire saw cutting method and apparatus therefor'20016,179,909'Work crystal orientation adjusting method and apparatus'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2003Patents assigned to SUMITOMO METAL IND (3)· patent assignee history
2001Patents assigned to NIPPEI TOYAMA CORP (1)· patent assignee history
2001Patents assigned to SUMITOMO SITIX CORP (1)· patent assignee history
2001–2003Based in Saga, JP· patent location history
2001Based in Kishima-gun, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SUMITOMO METAL IND32001–2003
NIPPEI TOYAMA CORP12001
SUMITOMO SITIX CORP12001
Locations
LocationPatentsSpan
Saga, JP32001–2003
Kishima-gun, JP12001