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Inventor

MARTIN VOELCKER

Inventor
DE

Overview

2→
Patents
2022–2023
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
G01NInvestigating or analysing materials by determining their chemical or physical properties33%
PatentTitleYear
11,774,870Method for removing a particle from a mask system202311,269,260Method and assembly for characterizing a mask or a wafer for microlithography2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2023Patents assigned to ZEISS CARL SMT GMBH (2)· patent assignee history
2022–2023Based in DE· patent location history
2023Patents assigned to ZEISS CARL SMS LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ZEISS CARL SMT GMBH22022–2023
ZEISS CARL SMS LTD12023
Locations
LocationPatentsSpan
DE22022–2023