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Inventor

Walter Imfeld

Inventor
Zurich, CH

Overview

3→
Patents
2000–2005
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing29%
G01NInvestigating or analysing materials by determining their chemical or physical properties29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
Y10TTechnical subjects covered by former us classification14%
PatentTitleYear
6,899,784'Apparatus for detecting CMP endpoint in acidic slurries'20056,506,341'Chemiluminescence detection apparatus'20036,021,679'Probe for slurry gas sampling'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2003Patents assigned to IBM (2)· patent assignee history
2000Based in Hombrechtikon, CH· patent location history
2003Patents assigned to ECO PHYSICS AG (1)· patent assignee history
2003–2005Based in Zurich, CH· patent location history
2005Patents assigned to ECOPHYSICS AG (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM22000–2003
ECO PHYSICS AG12003
ECOPHYSICS AG12005
Locations
LocationPatentsSpan
Zurich, CH22003–2005
Hombrechtikon, CH12000