Inventor
Shota Katayama
Inventor
Kawasaki, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
C07CAcyclic or carbocyclic compounds11%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%
C08LCompositions of macromolecular compounds11%
C12NMicroorganisms or enzymes11%
H01LSemiconductor devices11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
PatentTitleYear
10,604,770Method for extracting differentiated cells202010,054,855Chemically amplified positive-type photosensitive resin composition20189,557,651'Chemically amplified positive-type photosensitive resin composition'20179,372,403'Chemically amplified photosensitive resin composition and method for producing resist pattern using the same'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2018Patents assigned to TOKYO OHKA KOGYO CO LTD (3)· patent assignee history
2016–2017Based in Kawasaki, JP· patent location history
2018Based in Kanagawa, JP· patent location history
2020Patents assigned to UNIV KYOTO (1)· patent assignee history
2020Based in Kyoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 3 | 2016–2018 |
| UNIV KYOTO | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 2 | 2016–2017 |
| Kyoto, JP | 1 | 2020 |
| Kanagawa, JP | 1 | 2018 |