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Inventor

De-Chen Tseng

Inventor
New Taipei, TW

Overview

3→
Patents
2019–2021
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
11,003,089Method and apparatus for dynamic lithographic exposure202110,663,868Method and apparatus for dynamic lithographic exposure202010,274,830Method and apparatus for dynamic lithographic exposure2019

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2019–2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (3)· patent assignee history
2019–2021Based in New Taipei, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD32019–2021
Locations
LocationPatentsSpan
New Taipei, TW32019–2021