Inventor

Nobuyuki Akiyama

Inventor

Yokohama, JP

Overview

38→

Patents

1978–2019

Patent span

Physics

Primary field (CPC G)

Patents· 38 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%

G01NInvestigating or analysing materials by determining their chemical or physical properties17%

G01BMeasuring length, thickness or similar linear dimensions8%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

H01BCables5%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%

LOC104%

B22FWorking metallic powder3%

B23KSoldering or unsoldering3%

C04BLime, magnesia3%

PatentTitleYear

10,366,963Noble metal paste for bonding of semiconductor element2019 10,106,691Metal paste for gas sensor electrode formation2018 9,758,680'Metal paste for gas sensor electrode formation'2017 9,539,671'Precious metal paste for bonding semiconductor element'2017 8,201,973'Flame detector'2012 D0651926'Fire detector'2012 D0621287'Fire detector'2010 6,057,775'Ionization smoke detector'2000 5,747,364'Method of making semiconductor wafers and semiconductor wafers made thereby'1998 D0382217'Fire detector'1997 5,278,012'Method for producing thin film multilayer substrate, and method and apparatus for detecting circuit conductor pattern of the substrate'1994 5,245,270'Energy storage system'1993 5,098,191'Method of inspecting reticles and apparatus therefor'1992 5,046,847'Method for detecting foreign matter and device for realizing same'1991 4,965,454'Method and apparatus for detecting foreign particle'1990 4,938,598'Method and apparatus for position detection on reduction-projection system'1990 4,925,755'Method of correcting defect in circuit pattern'1990 4,788,577'Substrate surface deflecting device'1988 4,647,196'Surface flaw detection method'1987 4,614,427'Automatic contaminants detection apparatus'1986 4,541,715'Apparatus for detecting contaminants on the reticle of exposure system'1985 4,508,453'Pattern detection system'1985 4,504,045'Wafer transforming device'1985 4,491,787'Flatness measuring device'1985 4,475,223'Exposure process and system'1984 4,460,273'Test apparatus for defects of plate'1984 4,449,818'Method of inspecting microscopic surface defects'1984 4,447,731'Exterior view examination apparatus'1984 4,433,235'Focusing position detecting device in optical magnifying and observing apparatus'1984 4,423,331'Method and apparatus for inspecting specimen surface'1983 4,403,336'X-Ray exposure apparatus'1983 4,391,511'Light exposure device and method'1983 4,362,389'Method and apparatus for projection type mask alignment'1982 4,343,553'Shape testing apparatus'1982 4,242,702'Apparatus for automatically checking external appearance of object'1980 4,153,371'Method and apparatus for reduction-projection type mask alignment'1979 4,115,762'Alignment pattern detecting apparatus'1978 4,095,905'Surface-defect detecting device'1978

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1978–1994Patents assigned to HITACHI LTD (25)· patent assignee history

1978–1994Based in Yokohama, JP· patent location history

1984–1987Patents assigned to HITACHI METALS LTD (2)· patent assignee history

1993–2012Based in Tokyo, JP· patent location history

1997–2012Patents assigned to NITTAN CO LTD (4)· patent assignee history

1998–2019Based in Hiratsuka, JP· patent location history

2012–2017Patents assigned to AKIYAMA NOBUYUKI (3)· patent assignee history

2017–2019Patents assigned to TANAKA PRECIOUS METAL IND (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HITACHI LTD	25	1978–1994
NITTAN CO LTD	4	1997–2012
AKIYAMA NOBUYUKIself	3	2012–2017
TANAKA PRECIOUS METAL IND	3	2017–2019
HITACHI METALS LTD	2	1984–1987

Locations

Location	Patents	Span
Yokohama, JP	27	1978–1994
Tokyo, JP	6	1993–2012
Hiratsuka, JP	5	1998–2019