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Inventor

Youzou Fukagawa

Inventor
Tochigi, JP

Overview

15→
Patents
1997–2020
Patent span
Physics
Primary field (CPC G)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices42%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
G02BOptical elements, systems or apparatus9%
G06FElectric digital data processing9%
B23KSoldering or unsoldering3%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
H01JElectric discharge tubes or discharge lamps3%
H01LSemiconductor devices3%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
10,810,340Semiconductor chip designing method, non-transitory storage medium storing semiconductor chip designing program, semiconductor device production method, and arithmetic device20209,310,695'Exposure apparatus, method of obtaining amount of regulation of object to be regulated, program, and method of manufacturing article'20168,811,714'Method, apparatus and medium for determining the intensity distribution formed on a pupil plane of an illumination optical system'20148,493,551'Scanning exposure apparatus, control apparatus and method of manufacturing device'20138,450,031'Determination method, exposure method and storage medium'20137,894,039'Exposure apparatus and method, and device manufacturing method'20117,346,886'Method and apparatus for determining chip arrangement position on substrate'20087,301,615'Optical apparatus, method of determining position of optical element in optical system, and device manufacturing method'20077,230,692'Optical apparatus, method of determining position of optical element in optical system, and device manufacturing method'20077,084,957'Scanning exposure technique'20066,947,119'Distortion measurement method and exposure apparatus'20056,854,105'Chip arrangement determining apparatus and method'20056,081,319'Illumination system and scan type exposure apparatus'20005,878,068'Energy quantity control method'19995,684,856'Stage device and pattern transfer system using the same'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2016Patents assigned to CANON KK (14)· patent assignee history
1997Based in Yokohama, JP· patent location history
1999–2020Based in Tochigi, JP· patent location history
2011Based in Kawachi-gun, JP· patent location history
2013–2014Patents assigned to FUKAGAWA YOUZOU (3)· patent assignee history
2013–2014Patents assigned to GYODA YUICHI (2)· patent assignee history
2013–2014Patents assigned to ISHII HIROYUKI (2)· patent assignee history
2013Patents assigned to HIRATA MITSUO (1)· patent assignee history
2013–2016Based in Utsunomiya, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK141997–2016
FUKAGAWA YOUZOUself32013–2014
GYODA YUICHI22013–2014
ISHII HIROYUKI22013–2014
HIRATA MITSUO12013
Locations
LocationPatentsSpan
Tochigi, JP91999–2020
Utsunomiya, JP42013–2016
Kawachi-gun, JP12011
Yokohama, JP11997