Inventor
Joel Seligson
Inventor
Misgav, IL
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
G01NInvestigating or analysing materials by determining their chemical or physical properties16%
G01BMeasuring length, thickness or similar linear dimensions15%
G02BOptical elements, systems or apparatus9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
G03HHolographic processes or apparatus4%
G06FElectric digital data processing3%
H04NPictorial communication, e.g. television3%
Y02PClimate change mitigation technologies in the production or processing of goods3%
B41JTypewriters1%
PatentTitleYear
10,274,425Structured illumination for contrast enhancement in overlay metrology201910,261,014Near field metrology201910,139,528Compound objectives for imaging and scatterometry overlay20189,645,079'Structured illumination for contrast enhancement in overlay metrology'20179,442,369'Method and apparatus for lithographic mask production'20169,164,397'Optics symmetrization for metrology'20159,104,120'Structured illumination for contrast enhancement in overlay metrology'20159,080,971'Metrology systems and methods'20158,908,175'Flexible scatterometry metrology system and method'20148,896,832'Discrete polarization scatterometry'20148,873,054'Metrology systems and methods'20148,681,413'Illumination control'20148,582,114'Overlay metrology by pupil phase analysis'20138,441,639'Metrology systems and methods'20137,876,438'Apparatus and methods for determining overlay and uses of same'20117,724,375'Method and apparatus for increasing metrology or inspection tool throughput'20107,608,468'Apparatus and methods for determining overlay and uses of same'20097,602,491'Optical gain approach for enhancement of overlay and alignment systems performance'20097,528,941'Order selected overlay metrology'20097,440,105'Continuously varying offset mark and methods of determining overlay'20087,310,789'Use of overlay diagnostics for enhanced automatic process control'20077,111,256'Use of overlay diagnostics for enhanced automatic process control'20066,928,628'Use of overlay diagnostics for enhanced automatic process control'20056,172,349'Autofocusing apparatus and method for high resolution microscope system'20014,805,038'Imaging apparatus which includes a light-valve array having electrostatically deflectable elements'19894,731,670'Imaging apparatus'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988Based in Rochester, NY, US· patent location history
1989–2019Based in Misgav, IL· patent location history
2001–2019Patents assigned to KLA TENCOR CORP (17)· patent assignee history
2005–2011Patents assigned to KLA TENCOR TECH CORP (6)· patent assignee history
2008Based in Manof, IL· patent location history
2013–2015Patents assigned to KANDEL DANIEL (6)· patent assignee history
2013–2015Patents assigned to SELIGSON JOEL (6)· patent assignee history
2013–2015Patents assigned to MANASSEN AMNON (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 17 | 2001–2019 |
| KANDEL DANIEL | 6 | 2013–2015 |
| KLA TENCOR TECH CORP | 6 | 2005–2011 |
| SELIGSON JOELself | 6 | 2013–2015 |
| MANASSEN AMNON | 5 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Misgav, IL | 24 | 1989–2019 |
| Manof, IL | 1 | 2008 |
| Rochester, New York, US | 1 | 1988 |