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Inventor

Jerome P. Silverman

Inventor
White Plains, NY, US

Overview

2→
Patents
1993–1999
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
G21KHandling of particles or ionising radiation not otherwise provided for50%
PatentTitleYear
6,009,143'Mirror for providing selective exposure in X-ray lithography'19995,268,951'X-ray beam scanning method for producing low distortion or constant distortion in x-ray proximity printing'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–1999Patents assigned to IBM (2)· patent assignee history
1993–1999Based in White Plains, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM21993–1999
Locations
LocationPatentsSpan
White Plains, New York, US21993–1999